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LABORATORY FOR THIN-FILM DEPOSITION
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MESSAGE FROM THE DEAN

2001-2002 HIGHLIGHTS

COLLEGE DEPARTMENTS

INTERDISCIPLINARY DEGREE PROGRAMS

COLLEGE CONSORTIA

COLLEGE CENTERS

COLLEGE SERVICES

PRIVATE SUPPORT

2001-2002 FINANCIAL SUMMARY

2002-2003 INDUSTRIAL ADVISORY BOARD

FACULTY AND DEPARTMENT DIRECTORY

CREDITS

LABORATORY FOR THIN-FILM DEPOSITION

Max G. Lagally (Director)
1109 Engineering Research Building
1500 Engineering Drive
Madison, WI 53706-1687

Tel: 608/263-2078
Fax: 608/265-4118
E-mail: lagally@engr.wisc.edu

  • Investigates fundamental mechanisms of thin-film growth using various thermal and plasma deposition methods; develops instrumentation to investigate growth processes in situ and in real time in hostile environments.

  • Emphasizes role of defects and impurities in growth, characterization of local atomic mechanisms involved in kinetics of growth, and theoretical studies of the growth process.

  • Designs and develops novel film structures and combinations of materials at the nanoscale; growth processes for semiconductors at the nanoscale; magnetic thin films and carbon nanotubes.

 



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Date last modified: Monday, 30-Sep-2002 08:33:56 CDT
Date created: 30-Sep-2002
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