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CENTER FOR PLASMA-AIDED MANUFACTURING
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MESSAGE FROM THE DEAN

2001-2002 HIGHLIGHTS

COLLEGE DEPARTMENTS

INTERDISCIPLINARY DEGREE PROGRAMS

COLLEGE CONSORTIA

COLLEGE CENTERS

COLLEGE SERVICES

PRIVATE SUPPORT

2001-2002 FINANCIAL SUMMARY

2002-2003 INDUSTRIAL ADVISORY BOARD

FACULTY AND DEPARTMENT DIRECTORY

CREDITS

CENTER FOR PLASMA-AIDED MANUFACTURING

Noah Hershkowitz (Director)
Room 101
1410 Engineering Drive
Madison, WI 53706-1608

Tel: 608/263-4970
Fax: 608/265-2364
E-mail: hershkowitz@engr.wisc.edu
cpam.engr.wisc.edu

  • Provides "one-stop shopping" to assist industry in all aspects of plasma-aided manufacturing.

  • Uses plasmas from less than 1 mTorr to greater than 1 atm to modify surface properties and materials in various manufacturing processes.

  • Develops/maintains an excellent collection of gas-phase plasma diagnostics.

  • Develops plasma etching techniques for semiconductors and non-semiconductor applications. Employs a variety of high-density plasma and capacitive etch tools.

  • Develops plasma-based deposition of thin films using plasma chemical vapor deposition and ionized physical vapor deposition as well as plasma spray techniques.

 



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Date last modified: Monday, 23-Sep-2002 11:24:00 CDT
Date created: 23-Sep-2002
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