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CENTER FOR PLASMA-AIDED MANUFACTURING
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THE DEAN'S MESSAGE

2000-2001 HIGHLIGHTS

COLLEGE DEPARTMENTS


Biomedical Engineering
Chemical Engineering
Civil and Environmental Engineering
Electrical and Computer Engineering
Engineering Physics
Engineering Professional Development
Industrial Engineering
Materials Science and Engineering
Mechanical Engineering

INTERDISCIPLINARY DEGREE PROGRAMS

COLLEGE CONSORTIA

COLLEGE CENTERS

COLLEGE SERVICES

PRIVATE SUPPORT

2000-2001 FINANCIAL SUMMARY

FACULTY AND DEPARTMENT DIRECTORY

2001-2002 INDUSTRIAL ADVISORY BOARD

CREDITS

CENTER FOR PLASMA-AIDED MANUFACTURING

Noah Hershkowitz (Director)
Room 101
1410 Engineering Drive
Madison, WI 53706-1608

Tel: 608/263-4970
Fax: 608/265-2364
E-mail: hershkowitz@engr.wisc.edu
cpam.engr.wisc.edu

  • Provides "one-stop shopping" to assist industry in all aspects of plasma-aided manufacturing.

  • Uses plasmas from less than 1 mTorr to greater than 1atm to modify surface properties and materials in various manufacturing processes.

  • Develops plasma etching techniques for semiconductors and non-semiconductor applications. Employs a variety of high-density plasma and capacitive etch tools.

  • Develops plasma-based deposition of thin films using plasma chemical vapor deposition and ionized physical vapor deposition as well as plasma spray techniques.

  • Develops/maintains an excellent collection of gas-phase plasma diagnostics.

 



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Date last modified: Tuesday, 26-Feb-2002 14:54:00 CST
Date created: 26-Feb-2002
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