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Center for Plasma-Aided Manufacturing
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Provides "one-stop shopping" to assist industry in all aspects of
plasma-aided manufacturing.
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Uses plasmas from less than 1 mTorr to greater than 1atm to modify
surface properties and materials in various manufacturing processes.
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Develops plasma etching techniques for semiconductors and
non-semiconductor applications. Employs a variety of high-density
plasma and capacitive etch tools.
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Develops plasma-based deposition of thin films using plasma chemical
vapor deposition and ionized physical vapor deposition as well as
plasma spray techniques.
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Develops/maintains an excellent collection of gas-phase plasma
diagnostics.
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Copyright © 2000 University System Board of Regents
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