Annual Report 2000: Engineering InterAction
College of Engineering / University of Wisconsin-Madison

Center for Plasma-Aided Manufacturing

The Dean's Message

College Departments

Biomedical Engineering

Chemical Engineering

Civil and Environmental Engineering

Electrical and Computer Engineering

Engineering Physics

Engineering Professional Development

Industrial Engineering

Materials Science and Engineering

Mechanical Engineering

Interdisciplinary Degree Programs

2000-2001 Industrial Advisory Board

College Consortia

College Centers

College Services

Private Support

1999-2000 Financial Summary

Faculty and Department Directory

College Publications


Noah Hershkowitz (Director)
Room 101
1410 Engineering Drive
Madison, WI 53706-1608

Tel: 608/263-4970
Fax: 608/265-2364

  • Provides "one-stop shopping" to assist industry in all aspects of plasma-aided manufacturing.

  • Uses plasmas from less than 1 mTorr to greater than 1atm to modify surface properties and materials in various manufacturing processes.

  • Develops plasma etching techniques for semiconductors and non-semiconductor applications. Employs a variety of high-density plasma and capacitive etch tools.

  • Develops plasma-based deposition of thin films using plasma chemical vapor deposition and ionized physical vapor deposition as well as plasma spray techniques.

  • Develops/maintains an excellent collection of gas-phase plasma diagnostics.


Copyright © 2000 University System Board of Regents


Published: September 2000