Richard A. Dodd Professor Emeritus Address/E-mail Program Affiliations Education Fields of Interest Summary

Contact Information

1209 Engineering Research Building 1500 Engineering Drive Madison, WI 53706

Tel: 608/263-2197 Fax: 608/262-6707 E-mail: dodd@engr.wisc.edu

Departments

• Materials Science and Engineering

Program Affiliations

• Materials Science Program

Education

• BS (chemistry) 1944, University of London
• MS (crystallography) 1947, University of London
• PhD (metallurgy) 1950, University of Birmingham
• DSc (metallurgy) 1974, University of London

Fields of Interest

• crystallography
• crystal defects
• X-ray diffraction
• electron microscopy
• radiation damage
• alloys
• ion implantation
• corrosion

Summary

Both the radiation damage and ion implantation research programs are interdisciplinary, involving faculty from the Department of Materials Science and Engineering, and the Department of Engineering Physics.

There are several major concerns with materials to be used in future fusion reactors. Firstly, the microstructure and resulting properties of the engineered components must be adequately stable in the reactor environment, and, secondly, the problem of radioactive waste disposal requires that low-activation alloys be used wherever possible. It is difficult to meet these twin requirements simultaneously, and so research is continuing on a variety of possible candidate austenitic and ferritic steels. For the most part, heavy ion irradiation is used to study the damage resistance, although some off-campus neutron irradiations have been performed.

Ion implantation has long been used to dope semiconductors, and it is now being rapidly developed as a tool to improve both the wear and corrosion resistance of components. The synergistic effects of wear and corrosion are proving to be particularly important in alloys which rely on the existence of a passive film for their corrosion resistance. Removal of the passive film by local wear causes greatly enhanced corrosive attack at these film-free sites due to passive/active cells.

The plasma source technique was developed at the University of Wisconsin and, unlike conventional implantation, it is not a line-of-sight process, making it a very cost-effective technique. Ion implantation is not limited by thermodynamic constraints, and so surfaces can be engineered to produce unique properties. Modifications of simple implantation such as ion beam mixing and ion beam enhanced deposition are being developed.

Copyright 2005 The Board of Regents of the University of Wisconsin System Date last modified: Thursday, 01-Jul-1999 10:31:35 CDT Content by: dodd@engr.wisc.edu Thank you for visiting! UPDATE PROFILE