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MS&E 434 - Introduction to Thin-Film Deposition Processes

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Catalog Description
434 Introduction to Thin-Film Deposition Processes. II,Alt Yrs; 3cr. Introduction to major thin-film deposition techniques and properties of thin films. Evaporation, plasma assisted processes with emphasis on sputter deposition, chemical vapor deposition ion beams. Film properties and characterization methods, applications. P:MS&E 330 and 351, or equiv.

Course Prerequisite(s)

Prerequisite knowledge and/or skills

Textbook(s) and/or other required material

Instructor's handouts.

Course objectives

To develop fundamental understanding of major vapor phase thin-film deposition processes.

Topics covered

Class/laboratory schedule

Contribution of course to meeting the professional component
This course contributes primarily to the students' knowledge of engineering topics, but does not provide design experience.

The following statement indicates which of the following considerations are included in this course: economic, environmental, ethical, political, societal, health and safety, manufacturability, sustainability.

Relationship of course to undergraduate degree program objectives and outcomes
This course serves students in a variety of engineering majors. The information below describes how the course contributes to the college's educational objectives.

Provides background in an area of considerable industrial importance that is of interest to a variety of majors (e.g., ECE, ChE, EP, MS&E, ME).

Assessment of student progress toward course objectives

Person(s) who prepared this description



Copyright 2007 The Board of Regents of the University of Wisconsin System
Date last modified: 04-Aug-2007
Content by: kailhofer@engr.wisc.edu
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