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Alex Wei receives his SPIE/BACUS Scholarship, awarded by SPIE The International Society for Optical Engineering. Presenting the award is Fred Peiffer of Agere Systems, a sponsor of the scholarship.
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Alexander Wei, a PhD student in the Department of Mechanical Engineering, has been awarded the 2003 SPIE/BACUS Photomask Scholarship, annually awarded by SPIE The International Society for Optical Engineering.
The scholarship recognizes outstanding work by students in the areas of photomask and microlithography manufacturing for the semiconductor industry.
In addition, Wei received a best paper award at the 2003 Electron, Ion and Photon Beam Technology and Nanofabrication Conference held in Florida, and was invited to present a paper at the Micro- and Nano-engineering Conference held in Cambridge, England.
Wei is a research assistant in the COE Computational Mechanics Center and is completing his dissertation on fluid flow and heat transfer as it relates to immersion lithography. Assistant Professor Gregory Nellis is Wei's advisor.