At the 22nd European Mask and Lithography Conference (EMLC) held January 23-26 in Dresden, Germany, the Best Paper Award went to ME Computational Mechanics Center researchers including Mechanical Engineering Researcher Scott Schuetter, ME Assistant Professor Tim Shedd, Engineering Physics undergraduate student Keith Doxtator and ME Assistant Professor Greg Nellis as well as Scientist Chris Van Peski of SEMATECH. Their paper, entitled "A correlation for predicting film pulling velocity in immersion lithography," addressed issues involved in extending the resolution of optical lithography to support the manufacturing of next-generation semiconductor devices. EMLC participants included researchers from Europe, Japan, Korea, Taiwan and the United States.

Copyright 2006 The Board of Regents of the University of Wisconsin System Date last modified: Friday, 17-Feb-2006 09:48:19 CST Date created: 17-Feb-2006 Content by: deptinfo@me.engr.wisc.edu Thank you for visiting /me/17Feb2006.html