A graduate student loads an automotive component into the Plasma Source Ion Implantation (PSII) chamber. (48K JPG)

Ion implantation using plasma-based ion sources rather than conventional beamlines is a recent UW-Madison development receiving considerable national and international attention. In this technique, the workpiece is surrounded by a plasma. A large negative pulse is applied to the workpiece to accelerate ions from the plasma into the workpiece. Plasma Source Ion Implantation (PSII) offers several advantages: non-line-of-sight implantation; no need for workpiece manipulation; the ability to implant large objects; and high throughput. Ion implantation can improve the surface properties (e.g. friction characteristics and corrosion & wear resistance) and modify the material composition in the surface layer. Research in plasma-based ion implantation is centered in the Plasma Source Ion Implantation Program and directed by Professor Conrad. Also contributing to this research are Professors Blanchard, Callen and Emmert (EP), and Professors Dodd and Matyi (materials science and engineering).

silver.neep.wisc.edu/psii