UW-Madison has embarked on an interdisciplinary effort in plasma processing and technology. Plasma processing is the use of the ions and free radicals present in plasma to alter the structure and/or properties of a particular material. This subject combines techniques traditionally associated with plasma science (plasma production, heating and confinement) with other techniques of materials science and chemistry. Some applications include sputter deposition, plasma etching, plasma polymerization, plasma torches and plasma spray.

Professor Noah Hershkowitz (front right) discusses plasma etching with a post-doc while students work on a Magnetically Confined Inductively Coupled Plasma (MCICP) etching tool in the Engineering Research Center for Plasma-Aided Manufacturing. (50K JPG)

These activities are conducted in the college's Center for Plasma-Aided Manufacturing. The work currently involves more than 20 faculty members, including Professor Hershkowitz (EP), and members of the departments of electrical and computer engineering, chemical engineering, materials science and engineering, chemistry and physics. Faculty, scientists and students from EP are contributing expertise in plasma diagnostics, RF techniques, plasma theory/modeling, and plasma electronics.

The objectives of this center are to develop new processes to satisfy the present and future needs of industry; develop new diagnostics, sensors, modeling and control strategies; and foster ties with industry for information exchange and technology transfer in plasma-aided manufacturing. Specific research topics within the center include plasma etching and microwave processing of microelectronics, plasma deposition and polymerization, plasma synthesis, and sintering and spraying of ceramics and refractory materials.

cpam.engr.wisc.edu