Noah Hershkowitz Irving Langmuir Professor Address/E-mail Program Affiliations Courses Education Fields of Interest Publications Awards & Honors Summary

Contact Information

Primary Address: 337 Engineering Research Building 1500 Engineering Drive Madison, WI 53706 Tel: 608/263-4970 Fax: 608/265-2364 E-mail: hershkowitz@engr.wisc.edu

Secondary Address: Room 101, 1410 Engieering Drive 1410 Egineering Drive Madison, WI 53706 Tel: 608/265- 2023 Fax: 608/262-3632

Departments

• Engineering Physics

Program Affiliations

• Center for Plasma-Aided Manufacturing
• Phaedrus Laboratory for Plasma Science
• Wisconsin Plasma Processing and Technology Research Consortium

Courses

• NE (NEEP) 305: Fundamentals of Nuclear Engineering
• NE (NEEP) 427: Nuclear Instrumentation Laboratory
• NE (NEEP) 525: Introduction to Plasmas
• NE (NEEP) 526: Laboratory Course in Plasmas
• NE (NEEP) 528: Plasma Processing and Technology
• NE (NEEP) 602: Special Topics in Reactor Engineering
• NE (NEEP) 725: Plasma Kinetic Theory and Radiation Processes
• NE (NEEP) 990: Research and Thesis

Education

• BS 1962, Physics, Union College (Schenectady, NY)
• PhD 1966, Physics, Johns Hopkins University

Fields of Interest

• plasma etching,
• plasm-aided manufacturing,
• basic plasma physics, ICRF effects,
• laboratory space plasma physics

Selected Publications

• Over 240

Selected Awards, Honors and Societies

• Fellow of the American Physical Society
• Fellow of the Institute of Electrical and Electronics Engineers (IEEE)
• Nuclear & Plasma Sciences Merit Award (1987)
• IEEE Plasma Sciences and Applications Award (1993)
• Byron Bird Award for Excellence in Research Publication (1994)

Summary

Professor Hershkowitz is an experimental plasma physicist with current research interests in plasma-aided manufacturng, basic plasma physics, plasma diagnostics and in in RF effects inprocessing and in fusion plasmas,. He is Director of tge Center for Plasma-Aided manufacturing (C-PAM) and of the Phaedrus laboratory for Plasma Science which investigate plasma applications and basic science issues associated with colder plasmas (about 3 eV) respectively.

C-PAM is investigating plasma etching, thin layer deposition and thick layer deposition using a large variety of plasma tools operating at pressures ranging from below 1mTorr to 1 atm. C-PAM also has a very extensive set of in-situ gas phase diagnostics. This Center is providing important input to U.S. industry.

Phaedrus studies curently include Bohm presheath physics and helicon wave studies.

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