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Faculty and students in the Electromagnetic Fields and Waves group are involved in both experimental and theoretical research to develop state-of-the-art microwave and optical components, processes, and systems. Research includes work on sources of, components for, and applications of coherent electromagnetic microwave radiation. This includes microwave-integrated circuits for communications, high-power microwave beam forming reflector systems for (fusion) plasma heating, electron beam sources of high-power microwaves (vacuum electronics), the use of microwave radiation in materials’ processing, microwave scan probe techniques, and computational electromagnetic models.
Faculty: Anderson, Booske, Hagness, Hitchon, Scharer, Shohet, van der Wiede, Vernon, Wendt
Solid State faculty are involved in the study of the electronic properties of matter and the development of technologies based on these discoveries. Research in this area includes elucidation of carrier dynamics in artificial semiconductor structures (e.g., quantum wells and dots) using both measurements and modeling, fabrication and characterization of ultra-fast electronic and opto-electronic devices, fabrication of MEMs-based micro-actuators and micro-sensors, advanced lithography and processing techniques for integrated circuitry, and bioelectronics. Associated centers include the Center for Nano Technology and the Reed Center for Photonics.
Faculty: Blick, Botez, Cerrina, Hitchon, Knezevic, Jiang, Ma, Mawst, McCaughan, Shohet, van der Weide
Photonics is the application of light to communications, signal processing, computing, and sensing. Areas of active research include high-power semiconductor diode lasers, active-photonic-lattice lasers, grating surface-emitting lasers, vertical-cavity surface-emitting lasers, intersubband-transition quantum-well semiconductor lasers, quantum box lasers, opto-electronic devices such as optical amplifiers, guided wave-based optical modulation and switching, nonlinear optical devices for optical logic and optical signal processing, and new materials structures such as nonlinear photonic lattices.
Faculty: Botez, Cerrina, Hagness, Knezevic, Mawst, McCaughan, Scharer
Plasmas, or ionized gasses, have two broad applications: industrial plasmas and fusion plasmas. The former serves as chemical “factories” by activating otherwise neutral particles for deposition, etching, or embedding materials. Applications of this technology encompass a very wide range of industries, ranging from microelectronics to jet engines. Related to this is research into radio frequency and laser-formed plasma sources. Fusion plasmas, a potentially limitless source of energy, has been a major activity at Wisconsin for three decades. It is the largest and most diverse program of its type in the United States. Since fusion plasmas are affected by electric and magnetic fields, research in the department has concentrated on the use of such fields to heat and confine fusion plasmas to approach ignition conditions.
Faculty: Anderson, Hitchon, Scharer, Shohet, Wendt
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Copyright 2007 The Board of Regents of the University of Wisconsin System Date last modified: 01-Mar-2007 Date created: 18-Oct-2000 Content by: ece@engr.wisc.edu Accessibility Web services UW-Madison : COE : ECE : ECE Site Map |