Cerrina, Franco

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Franco Cerrina

Franco Cerrina
Lynn H. Matthias Professor in Engineering

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Contact Information

3539 Engineering Hall
1415 Engineering Drive
Madison, WI 53706-1691

Tel: 608/263-4955
E-mail: fcerrina@wisc.edu

Program Affiliations

Education

PhD, Physics (Solid State), 1974, University of Rome

Fields of Interest

Biotechnology: DNA synthesis, DNA microarrays, oligomer synthesis, synthetic biology, DNA arrays, stem cells, and gene synthesis
Nanotechnology: nanostructure fabrications, processing, and patterning
Lithography: Optical lithography, electron beam lithography, extreme ultraviolet lithography, modeling, masks, and imaging
Optics: Modeling, design, analysis, systems and components, lithography, and imaging theory
Semiconductors: Fabrication, process modeling, and process design
X-rays: Optics, modeling, synchrotron radiation, applications to imaging, microscopy, lithography, and spectroscopy

Publications

The following recent citations were selected from more than 250 reviewed publications.

I. Junarsa, M. Stoykovich, P. Nealey, Y. Ma, F. Cerrina, H. Solak, Hydrogen Silsesquioxane As A High Resolution Negative-Tone Resist For Extreme Ultraviolet Lithography, J. Vac. Sci. Technol. B, 23 (1), (2005)
Y. Ma, F. Cerrina, Effect of a surface inhibition layer on line edge roughness, J. Vac. Sci. Technol. B 23 (3), (2005)
D. Amy, L. Jiang, R. Zheng, M. Feldman, F. Cerrina, S. Dhuey, Q. Leonard, D. Thielman, Minimal zone plates for x-ray lithography, J. Vac. Sci. Technol. B 22 (6), (2004)
D. Malueg, J. Taylor, D. Thielman, Q. Leonard, S. Dhuey, F. Cerrina, Modeling, fabrication, and experimental application of clear x-ray phase masks, J. Vac. Sci. Technol. B 22(6), (2004)
C. Kim, M. Li, M. Rodesch, A. Lowe, K. Richmond, and F. Cerrina, Biological lithography: Improvements in DNA synthesis methods, J. Vac. Sci. Technol. B 22 (6), (2004)
V. Golovkina, P. Nealey, F. Cerrina, J. Taylor, H. Solak, C. David, J. Gobrecht, Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography, J. Vac. Sci. Technol. B 22 (1), (2004)
C. Kim, M. Li, A. Lowe, N. Venkataramaiah, K. Richmond, J. Kaysen and F. Cerrina, DNA microarrays: An imaging study, J. Vac. Sci. Technol. B, 21(6), (2003)
M. A. Ali, K. E. Gonsalves, V. Golovkina and F. Cerrina, High sensitivity nanocomposite resists for EUV lithography, Microelectron Eng, 65(4), (2003)
L. Alianelli, M. S. del Rio, M. Khan and F. Cerrina, A comment on ‘A new ray-tracing program RIGTRACE for X-ray optical systems,’ J. Synchrotron Rad. (2001), 8, 1047-1050, J. Synchrot. Radiat., 10 (2003)
J. Dai, C. K. Ober, S.-O. Kim, P. F. Nealey, V. Golovkina, J. Shin, L. Wang and F. Cerrina, Synthesis and evaluation of novel organoelement resists for EUV lithography, SPIE Proceedings, 5039, 1164-1172, (2003)
G. Han, M. Khan and F. Cerrina, Stochastic modeling of high energy lithographies, J. Vac. Sci. Technol. B, 21(6), (2003)
C. Kim, M. Li, A. Lowe, N. Venkataramaiah, K. Richmond, J. Kaysen and F. Cerrina, DNA microarrays: An imaging study, J. Vac. Sci. Technol. B, 21(6), (2003)
B. Lu, J. R. Wasson, S.-I. Han, P. Mangat, V. Golovkina and F. Cerrina, EUV radiation damage test on EUVL mask absorber materials, SPIE Proceedings, 5256, 1232-1238, (2003)
Y. S. Ma, J. Shin and F. Cerrina, Line edge roughness and photoresist percolation development model, J. Vac. Sci. Technol. B, 21(1), (2003)
Y. Ma, G. Tsvid and F. Cerrina, Line edge roughness of sub-100 nm dense and isolated features: Experimental study, J. Vac. Sci. Technol. B, 21(6), (2003)
H. H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina, S. O. Kim and P. F. Nealey, Sub-50 nm period patterns with EUV interference lithography, Microelectron. Eng., 67-8 (2003)
V.N. Golovkina, P.F. Nealey, F. Cerrina, J.W. Taylor, H. Solak, C. David, J. Gobrecht, Exploring the Ultimate Resolution of Positive-Tone Chemically-Amplified Resists: 26nm Dense Lines Using EUV Intereference Lithography (EUV-IL), J. Vac. Sci. Technol. B 22 (1) (2004)
D. Amy, L. Jiang, M. Feldman, F. Cerrina, S. Dhuey, Q. Leonard, D. Thielman, Minimal Zone Plates For X-Ray Lithography, J. Vac. Sci. Technol. B 22(6) (2004)
F. Cerrina, F. Blattner, W. Huang, Y. Hue, R. Green, S. Singh-Gasson and M. Sussman, Biological lithography: development of a maskless microarray synthesizer for DNA chips, Microelectron. Eng., 61-2, (2002)
E. F. Nuwaysir, W. Huang, T. J. Albert, J. Singh, K. Nuwaysir, A. Pitas, T. Richmond, T. Gorski, J. P. Berg, J. Ballin, M. McCormick, J. Norton, T. Pollock, T. Sumwalt, L. Butcher, D. Porter, M. Molla, C. Hall, F. Blattner, M. R. Sussman, R. L. Wallace, F. Cerrina and R. D. Green, Gene expression analysis using oligonucleotide arrays produced by maskless photolithography, Genome Res., 12(11), (2002)
P. J. Krysan, R. Green, F. Cerrina and M. R. Sussman, A knockout for every gene and a chip for every purpose, Faseb J., 15(5), (2001)
S. Singh-Gasson, R. D. Green, Y. J. Yue, C. Nelson, F. Blattner, M. R. Sussman and F. Cerrina, Maskless fabrication of light-directed oligonucleotide microarrays using a digital micromirror array, Nat. Biotechnol., 17(10), (1999) 218.

Selected Awards, Honors and Societies

Awards:

John Bascom Chair of Electrical and Computer Engineering, 2001
American Physical Society (APS) Fellow, 2001
Optical Society of America (OSA) Fellow, 1999
Aristotle Award, Semiconductor Research Corp., 1998
Institute of Electronic and Electrical Engineering (IEEE) Fellow, 1996

Selected Professional Service:

Advisory Committee for International Symposium on Electron, Ion, Photon Beam Technology, and Nanofabrication, 1996-present
Program Committee for Micro and Nano Engineering Conference International, 1996-present
Co-chair of SPIE Symposium on X-ray Optics and Detectors, Denver, 1999
Chair of Proposal Program Review Committee at Elettra, TS, 1998-1999
Program Committee for Microprocess Conference, 1999-present
Co-chair of X-ray Optics Ray Tracing: Status and Needs, Synchrotron Radiation Instrumentation Conf., Argonne, October 1995
Co-chair of Microfabrication with Synchrotron Radiation, Synchrotron Radiation Instrumentation Conf., Argonne, October 1995
Co-chair of 1995 MRS Workshop on Materials: Nanostructure fabrication and properties, San Francisco, March 1995

Summary

I joined the Electrical and Computer Engineering department in 1984, and since 1988 I have served as director of the Center for NanoTechnology, an internationally recognized organization for research in advanced semiconductor lithography and nanofabrication. I have procured and managed over $45 million in grants and research contracts and hold 11 patents. I am president and chief technology officer of Genetic Assemblies, Inc., a firm I co-founded in 2003. I am a member of the board of directors of NimbleGen Systems, Inc., a company I co-founded in 1999 to commercialize a novel method for rapid synthesis of DNA microarray chips.

My research focuses on the application of physical sciences and engineering to manufacturing and biological problems, with a current focus on nanotechnology and biotechnology. The application of techniques developed for semiconductor nanofabrication to biological problems is the most important avenue of work in my research group. It has led to the invention of the Maskless Array Synthesizer (MAS), commercialized by NimbleGen Systems, Inc. We are working on better ways to synthesize DNA microarray chips and are developing new techniques for the synthesis of genetic material (long DNA sequences) de-novo, that is, by assembling the DNA base by base under computer control. These DNA molecules can be used for biological research, drug and vaccine development, and for genetic engineering. Ultimately, the ability to create DNA material “on demand” will open the door to “synthetic biology,” the creation of new organisms and life forms. Grant funds have advanced our work in nanolithography and, in collaboration with the BioTech Center, development of a biotechnology platform, the Automated Gene Synthesizer.

I have a long-standing interest in semiconductor processing and device fabrication, in particular, lithography, with a strong emphasis on the nanoscale – the region between molecular and microscopic structures. The development of advanced processors and memory chips requires more and more sophisticated nanoscale patterning, well below 100 nm. Working closely with semiconductor industries and the federal government, CNTech concentrates on Next Generation Lithography (NGL) development with a focus on nanopatterning. We actively research new methodologies for the patterning of nanostructures for both CMOS and quantum device applications. CNTech has an exceptional array of techniques available for fabrication and microscopy, from ultrafine electron beams to X-rays and atomic force microscopes.

Copyright 2006 The Board of Regents of the University of Wisconsin System
Date last modified: 04-Oct-2006
Content by: fcerrina@wisc.edu
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