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March Plasmod

Operating procedures are available.

March Plasmod

Process Description:
Plasma chemistry is a gentle, non-destructive technique for cleaning, etching and ashing. In oxygen plasma the atomic oxygen created is capable of gently oxidizing or "ashing" organic compounds. Oxygen plasma is useful as a photoresist removal process.

Equipment Description:
The March Plasmod is comprised of two interfaced units, a gas control module and quartz plasma reactor module. Oxygen gas is connected to one of the three gas channels and is controlled by a rotometer. The chamber vacuum of 0-50 Torr is achieved with a mechanical pump and monitored by a thermocouple pressure gauge. The RF power has a safety interlock on the chamber module door. The power level is 0-100 watts. The RF is also equipped with an additional tuning variable capacitor to optimize the RF power transfer to the plasma reactor.

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Copyright 2007 The Board of Regents of the University of Wisconsin System
Date last modified: 03-Feb-2003
Date created: 03-Feb-2003
Content by: rabauer@facstaff.wisc.edu
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