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Karl Suss MJB-3 I.R. Backside Contact Aligner

Operating procedures are available:

Karl Suss MJB-3 I.R. Backside Contact Aligner

Process Description:
Lithography is a process for optically projecting an image onto a wafer that has been coated with a thin layer of photosensitive material called photoresist. Contact or proximity printing is the simplest lithography method. When UV light passes through the pattern area of a chrome mask, it exposes the photoresist on the wafer and a chemical process occurs. After a developing solution bath and rinse, a pattern is transferred via the remaining photoresist on the wafer. The next process step, such as etching or ion implanting, can then be performed.

Equipment Description:
The MJB 3 aligner is equipped with a 350 watt mercury short-arc lamp. The filtered light source produces a combination of h-line and i-line wavelengths (280-350nm). Optimum line/space resolution is 0.4 microns. The alignment range of the X and Y is 6mm and the Theta range is 30°. Alignment is performed manually by manipulating micrometers while observing the wafer and mask with a microscope. This system is equipped with an optional infrared microscope lamp source for backside alignment. In the IR mode, a special chuck transparent to the IR spectrum is used. The lamp under this chuck has a high output in the IR range. This IR radiation is transmitted through the chuck and wafer to the microscope and camera.

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Copyright 2007 The Board of Regents of the University of Wisconsin System
Date last modified: 28-Aug-2001
Date created: 28-Aug-2001
Content by: rabauer@facstaff.wisc.edu
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