University of Wisconsin-Madison Wisconsin Center for Applied Microelectronics College of Engineering University of Wisconsin-Madison Wisconsin Center for Applied Microelectronics
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Filmetrics F-20 Optical Reflectometer

Operating procedures are available.

Filmetrics F-20 Optical Reflectometer

Process Description:
Properties of a thin film such as thickness, roughness, and optical constants can be measure by spectral reflectance. The amplitude and periodicity of the reflectance determine these properties. However, if the films are too thin, numerous, or complicated, there would not be sufficient information to resolve a unique solution.
Equipment Description:
The F-20 is a spectral reflectivity system that is PC-based and integrates measurement and analysis software with a spectrophotometer and fiber optic measurement hardware. The system is capable of modeling complex multilayer films. The F-20 system includes measurement of:

Semiconductors and coatings - SiO2, SiN, photoresist on silicon and III-V compounds, DBRs and VCSELs

Coatings - broad-band reflectors and anti-reflection

Protective coatings on plastics and flat panel displays layers - cell gap, ITO, polyimide

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Copyright 2009 The Board of Regents of the University of Wisconsin System
Date last modified: 20-Jul-2001 09:35:00
Date created: 20-Jul-2001
Content by: rabauer@facstaff.wisc.edu
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