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CHA-600 E-beam Evaporator, Metals

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Operating procedures are available:
Vent and Load
Changing the Crystal Sensor
First Deposition
Additional Deposition
Vent and Unload

CHA-600 E-beam Evaporator, Metals

Process Description:
Evaporation is a physical vapor deposition process performed in a vacuum environment. The deposition is from a thermal vaporization source with no gas, such as argon, to scatter the atoms or molecules. The trajectory of the vaporized material is "line-of-sight."
System Description:
The CHA-600 is a Telemark focussed electron-beam evaporation system. The focussed e-beam is directed into the material crucibles to heat the material until vaporization or sublimation occurs. The hearth is designed to hold four 7cc crucibles. This evaporation system has three substrate holders: a stationary dome for 6-4" wafers; a stationary dome for 12-3" wafers; and a platen that holds a single insert for a wafer or smaller samples. The high vacuum is achieved by a cryo-pump. A crystal oscillator is used to monitor film thickness in-situ.
Materials available are:

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Copyright 2007 The Board of Regents of the University of Wisconsin System
Date last modified: 02-Jan-2002
Date created: 20-Jul-2001
Content by: rabauer@facstaff.wisc.edu
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