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|Laboratory for Thin-Film Deposition|
Investigates fundamental mechanisms of thin-film growth using various thermal and plasma deposition methods; develops instrumentation to investigate growth processes in situ and in real time in hostile environments.
Emphasizes role of defects and impurities in growth, characterization of local atomic mechanisms involved in kinetics of growth, and theoretical studies of the growth process.
Designs and develops novel film structures and combinations of materials at the nanoscale, growth processes for semiconductors at the nanoscale, and multi-layer films on polymers.
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